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 光阻 Photoresist |
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通益集團提供以下型式光阻與應用方案:
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◎ For ArF (193nm) Immersion Lithography
◎ For ArF (193nm)
◎ For Electron Beam
◎ For KrF (248nm)
◎ For i-line (365nm)
◎ For g-line (436nm)
◎ Photoresist Stripping Solution
◎ Photoresist Developing Solution
◎ Rinsing Solution
◎ Thinner |
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| 光罩、保護膜與光罩盒 Photo Mask & Pellicle & Mask Box |
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通益集團提供以下型式高品質的光罩、保護膜與光罩盒: |
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光罩 PhotoMask
◎Standards (in inches)
2.5 x 2.5, 3.0 x 3.0, 4.0 x 4.0, 5.0 x 5.0, 6.0 x 6.0, 7.0 x 7.0 inches
◎Low Reflectance Chrome-film Mask Blanks
◎Attenuated Phase Shift Mask Blanks
◎Large Chrome Mask Blanks |
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保護膜 Pellicle
◎Semiconductor Pellicle
I line Pellicle
Deep UV Pellicle
ArF Pellicle
◎LCD Pellicle |
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光罩盒 Mask Box
◎Semiconductor Reticle Box
◎Reticle SMIF Pod
◎LCD Mask Box |
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| 化學品 Chemical |
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通益集團提供以下蝕刻及晶圓清洗之ULSI等級之高純度化學品: |
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| 製程氣體 Process Gas |
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通益集團提供以下高純度製程氣體: |
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| 晶舟 Cassette |
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通益集團提供以下型式之高品質的晶舟載具，並可符合現今無塵室對自動化及低發塵的需求。 |
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◎SMIF Pod, 6” 8”
◎Cassette : 6” 8”
◎FOUP 12”
◎Reticle SMIF pod |
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| PVD 濺鍍靶材 |
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通益集團提供以下型式高純度濺鍍靶材 ( 6”, 8”, 12” ): |
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◎Aluminum
◎Cobalt
◎Copper
◎Tantalum
◎Titanium
◎Tungsten |
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| 矽晶圓 Wafer |
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通益集團針對不同元件製程需求，可提供以下型式之矽晶圓(6”, 8”, 12” wafers) |
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◎Polished Wafers
◎Non-Polished Wafers
◎Doped Wafers
◎Epitaxial Wafers
◎Silicon-On-Insulator Wafers (SOI Wafers) |
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| 探針卡 Probe Card |
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通益集團針對晶圓電性測試需求，可提供以下型式之探針卡: |
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◎Max 32 duts probe card
◎LCD driver probe card
◎Fine pitch probe card |
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| Load Board |
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通益集團針對晶圓電性測試需求，可提供以下型式之Load Board: |
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◎Teradyne
◎AdvanTest
◎Credence
◎Agilent
◎LTXLoad
board: Interface to ATE (automatic testing equipment) |
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